The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division 摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
An interferometric lithographic experimental system with maskless and multi - beam exposure is built . an experimental system with wavefront divided by a trapezoidal prism and with selectable diaphragms for kinds of multi - beam , multiple - exposure interferometric lithography research is proposed . the experimental study on interferometric lithography is carried out 建立了无掩模多光束多曝光干涉光刻实验系统,提出了一种采用梯形棱镜进行波前分割和利用可选择光阑进行多种多光束多曝光干涉光刻研究的实验系统,进行了干涉光刻实验研究,对模拟和实验结果进行了分析。