Electron-beam lithography with a novel multilevel resist structure defines the pattern . 采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
Lithography, as used in the manufacture of ics, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer . 光刻技术应用到集成电路制造中,就是将掩模版的几何图形转移到硅片表面的工艺过程。
Analysis of nanometrology and atom photolithography 纳米计量与原子光刻技术分析
The prospect for the maskless lithography technology 无掩模光刻技术的前景
It also can give accurate figure 光刻线条均匀、一致,可以有效控制图形。
Recent progress in photolithography technology 光刻技术及其新进展
Factors of affecting patterning quality in holographic lithography 影响全息光刻图形质量的因素
Lithography - the process used to transfer patterns onto wafers 光刻-从掩膜到圆片转移的过程。
Fabrication technology of microlens array by melting photoresist 微透镜阵列的光刻胶热熔制作技术