The present article has two goals : first , the determination of the dependence of the complex refractive index of sige alloys on the ge concentration , and second , the demonstration of the application of in situ ellipsometry during rie for depth profiling of the ge content 本文有两个目标:第一,决定锗硅合金的复数折射率与锗浓度的关系,第二,验证得到锗浓度的纵向分布的rie同步椭偏测量的应用。
The composition , structure , and properties of the as prepared composite films have been characterized in detail by uv - vis , ftir , and x - ray photoelectron spectra , ellipsometry , scanning electron microscopy , atomic force microscopy , transmission electron microscopy , fluorescence spectroscopy , and standard four - probe technique 采用uv - vis光谱、 ftir光谱、 x -射线光电子能谱、椭圆光度法、扫描电子显微镜、原子力显微镜、透射电子显微镜、荧光光谱和标准四探针技术对所制备的纳米复合膜进行了组成、结构和性能表征。
Biology , etc . owing to many merits has not yet been used to measure parameters of gratings . the paper researches on the subject in view of current lack of it . the main tasks of the paper include : analyzing ellipsometric characteristics of gratings in detail with vector diffraction theory and ellipsometrics ; devising a reflective quarter wave plate at normal incidence according to some ellipsometric characteristics ; making use of normal simplex algorithm during ellipsometric inversion of gratings parameters , inversing ellipsometric parameters with gaussian noise of different standard deviations to simulate actually measured values with examples of isotropic metallic and anisotropic step gratings and testing that ellipsometry about gratings parameters is feasible with the range of certain precision ; discussing choice of incidence angle at length 本论文的主要工作包括:结合光栅的矢量衍射理论和薄膜的椭偏理论,详细分析了光栅的椭偏特性;并且根据一些椭偏特性设计出一款正入射反射型单波长1 4波片;在光栅参数的椭偏反演中,引入正单纯形法作为反演算法,分别以各向同性的正弦形金属光栅和各向异性的阶梯型光栅为例,在标准椭偏值的基础上加入不同偏差的高斯噪声来模拟实际的椭偏测量值进行反演,在一定精度范围内得出满意的光栅参数,说明光栅参数的椭偏测量是可行的;还就入射角的选取问题进行了一定的探讨。
For xrd , ellipsometry examinations , single - side - polished si ( lll ) wafers were used as substrates and for resistance measurement , glass was used and for infrared examination , double - side - polished si ( lll ) wafers were used and for ultraviolet - visible spectrophotometry , double - side - polished quartz wafers were used and for tem micrograph and electron diffraction pattern observation , cu nets deposited by formvar film were used . the cu - mgf2 cermet films were from 50 to 600nm thick 用于xrd分析、椭偏测量的单抛si ( 111 )晶片和电阻测试的载玻片上淀积膜厚约为600nm ;用于ir测试的双抛si ( 111 )晶片和uv测试的石英玻璃片上淀积膜厚约为250nm ;用于透射电镜分析的样品则淀积在400目铜网上的支撑formvar膜上,膜厚约为50 100nm 。
The structure properties of a - sinx : h are characterized and analyzed by using ellipsometry , fourier transform infrared ( ftir ) spectroscopy and x - ray photoelectron spectroscopy ( xps ) , all the results suggest that the films with the structure of silicon dots / clusters embedding in silicon nitride matrix can be obtained by controlling the hwp - cvd conditions properly 利用椭偏仪,傅立叶红外吸收谱( ftir ) , x射线光电子能谱( xps )等技术对a - sin _ x : h的结构特性进行了表征与分析,结果表明,采用hwp - cvd技术合理控制实验条件,可得到镶嵌在sin _ x中的纳米si结构薄膜。
1 . the principle and method of extracting the optical constants from transmission , reflection , differential , and ellipsometry ttds are reviewed and analyzed systematically . the programs using newton algorithm are developed to solve the equations . the extraction of other material parameters is also discussed in detail 主要有以下方面:一、总结分析了透射型、反射型、差分型、椭偏型thz时域光谱系统提取材料光学常数的原理、方法,利用newton迭代的方法编程解决了实验数据处理方面的一些问题。
The chemical composition , micro - structure and optical properties and its application of tio2 thin films deposited on k9 glass by using reactive electron - beam evaporation ( reb ) are studied through sem , tem , xps , xrd , spectroscopic ellipsometry ( se ) and uv - vis spectrophotometer in the dissertation , and the progresses of nucleation and growth of thin film are discussed from the point of view of dynamics and thermodynamics so that a structure model of tio _ ( 2 ) thin film is brought forward 本文采用sem 、 tem 、 xps 、 xrd 、椭圆偏振仪( se ) 、 uv - vis分光光度计等分析手段系统地研究了电子束反应蒸发方法在k9玻璃上制备tio _ 2薄膜的成分、结构和光学性能以及tio _ 2薄膜在光学多层膜中应用,并开发了膜系设计软件。文中还从动力学和热力学角度分析了tio _ 2超薄膜的形核生长过程,得出了tio _ 2薄膜的组织结构模型。
In this study , on the base of the present status and future development of semiconductor materials for solar cells , we have carried out the work to compose film structures of si - based materials by theoretical analysis and experimental methods , which have potential application in modules of solar cells . the processing , features of microstructure and optical properties of the designed si - based thin films have been studied in detail by employing methods of xrd , sem , afm , tem , raman , ftir , uv - vis , pl , and ellipsometry spectroscopy ( se ) 本文在全面总结目前太阳电池材料的研究现状和其未来发展趋势的基础上,系统地从理论和实验两方面对应用在太阳电池板上的si基薄膜材料的结构进行了设计,用超高真空磁控溅射仪研究了其制备工艺,用了xrd 、 sem 、 afm 、 tem 、 raman 、 ftir 、 uv - vis 、 pl和椭圆偏光仪( se )等分析手段研究了薄膜的相结构、微观组织特征和其所具有的光性能。
Ellipsometry based on polarized transformation , beams of light reflecting and transmitting on the thin films , is the method which inverse ellipsometric parameters processed by computers to obtain various of optic parameters of measured thin films . although a few researchers have discussed ellipsometric parameters of gratings on theory and experiment 椭偏测量技术是利用光束在薄膜上反射和透射时出现的偏振变化,通过椭偏仪测量其椭偏参数的变化,用计算机处理由测量得到的椭偏参数从而反演得到待测薄膜的各种光学参数。
Ellipsometry is an optical technique for the investigation of the dielectric properties (complex refractive index or dielectric function) of thin films.