The substrate is first covered by a mask . 首先在基片上覆盖一个掩膜片。
The reactors for this type of deposition are easily scaled to accommodate 125-or 150-mm wafers . 这种淀积反应器很容易达到适应125或150mm的基片。
The major advantages of these reactions are excellent uniformity, large load size, and ability to accommodate large diameter wafers . 这种反应器的主要优点是优越的均匀性,较大的负载量及适应大直径基片的能力。
Alumina ceramic substrates for thin film integratedcircuits 薄膜集成电路用氧化铝陶瓷基片
Alumina ceramic substrates for microwave integrated circuits 微波集成电路用氧化铝陶瓷基片