Why not use photolithography to make nanostructures 为什麽不使用光蚀刻法制造奈米结构?
Various technical improvements have made it possible to push the limits of photolithography 各种技术若能改进,便可推进光蚀刻法的极限。
Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [ see illustration on opposite page ] 接著,光蚀刻法用一种类似照相暗房中进行的过程(见右页图) ,把图案的尺寸缩小。
The photolithographic tools that will be used to make chips with features well below 100 nanometers will each cost tens to hundreds of millions of dollars 要在晶片上做出小于100奈米的图案细节,所需的光蚀刻工具每件要花上几千万到几亿美元。
Because these forms of radiation have much shorter wavelengths than the ultraviolet light currently used in photolithography , they minimize the blurring caused by diffraction 由于这类型辐射的波长远较现在光蚀刻使用的紫外光来得短,因此可以减少因绕射而造成的模糊。